Experimental and numerical correlation between current-collapse and fe-doping profiles in GaN HEMTs

A. Chini, V. Di Lecce, F. Soci, D. Bisi, A. Stocco, M. Meneghini, G. Meneghesso, E. Zanoni, A. Gasparotto
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引用次数: 10

Abstract

In this work, for the first time, the dependence of the GaN HEMTs current collapse from the profile of the Fe-doped semi-insulating GaN buffers has been demonstrated both experimentally and by means of numerical simulations based on the SIMS measured profile of the GaN buffer Fe-doping concentration.
氮化镓hemt中电流坍塌与铁掺杂谱的实验与数值相关性
在这项工作中,首次通过实验和基于SIMS测量的氮化镓缓冲铁掺杂浓度分布的数值模拟,证明了氮化镓hemt电流坍塌与掺铁半绝缘氮化镓缓冲层的关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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