R. Roucou, V. Fiori, F. Cacho, K. Inal, X. Boddaert
{"title":"Evaluation of probing process parameters and PAD designs: Experiments and modelling correlations for solving mechanical issues","authors":"R. Roucou, V. Fiori, F. Cacho, K. Inal, X. Boddaert","doi":"10.1109/ESIME.2010.5464594","DOIUrl":null,"url":null,"abstract":"Electrical Wafer Sort is known to induce stress in the pad structure and can lead to mechanical failures. In the present work, both EWS process (over drive and number of passes) and die pad design (thicknesses and interconnect layer architectures) parameters are evaluated through actual tests and Finite Element Modelling.","PeriodicalId":152004,"journal":{"name":"2010 11th International Thermal, Mechanical & Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems (EuroSimE)","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-04-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 11th International Thermal, Mechanical & Multi-Physics Simulation, and Experiments in Microelectronics and Microsystems (EuroSimE)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESIME.2010.5464594","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
Electrical Wafer Sort is known to induce stress in the pad structure and can lead to mechanical failures. In the present work, both EWS process (over drive and number of passes) and die pad design (thicknesses and interconnect layer architectures) parameters are evaluated through actual tests and Finite Element Modelling.