DFM in Perspective - A Challenge and Opportunity in Nanometer Era -

Shimohigashi
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Abstract

Summary form only given. The old good days, when the process and the design engineers were in each technology silo and didn't need to interact frequently, have gone. As the device size shrinks to nanometer scale and the integration level exceeds well over giga scale, the landscape of technology developments has become very different from the past. The variability, for example, becomes a critical issue not only for performance, but also for production yield. The problems, which have been seen as secondary for long time, suddenly come into play and will grow according to the device size reduction. The solution is DFM, design for manufacturing. The DFM will not be done without collaborations between various technology parties, such as process, design, mask, EDA, and so on. The DFM will give us a big challenge and opportunity in nanometer era. In this talk, the perspective of the DFM was presented and how the work-flow for making chips should be changed was discussed. The DFM initiative under a collaborative consortium scheme in Japan were also presented
透视DFM——纳米时代的挑战与机遇
只提供摘要形式。过去的美好时光已经一去不复返了,那时流程和设计工程师都在各自的技术筒仓里,不需要经常互动。随着器件尺寸缩小到纳米级,集成水平远远超过千兆级,技术发展的前景与过去大不相同。例如,可变性不仅是影响性能的关键问题,也是影响产量的关键问题。长期以来被认为是次要的问题,突然开始发挥作用,并将随着设备尺寸的缩小而增长。解决方案是DFM,为制造而设计。如果没有各种技术方之间的协作,例如流程、设计、掩模、EDA等,DFM将无法完成。在纳米时代,DFM将给我们带来巨大的挑战和机遇。在这次演讲中,提出了DFM的观点,并讨论了如何改变芯片制造的工作流程。还介绍了日本一个合作财团计划下的可持续发展管理倡议
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