{"title":"A high performance 0.35 /spl mu/m 3.3 V BiCMOS technology optimized for product porting from a 0.6 /spl mu/m 3.3 V BiCMOS technology","authors":"J. Schutz, M. Bohr","doi":"10.1109/BIPOL.1995.493862","DOIUrl":null,"url":null,"abstract":"A 0.35 /spl mu/m logic technology has been developed with high performance transistors and four layers of planarized metal interconnect. A 2.5 V version offers lower power and higher performance. A 3.3 V BiCMOS version has been optimized for compatibility with previous designs implemented in a 0.6 /spl mu/m 3.3 V BiCMOS process. The design process for converting an existing production worthy 0.6 /spl mu/m 3.3 V BiCMOS design is described. The silicon results are described.","PeriodicalId":230944,"journal":{"name":"Proceedings of Bipolar/Bicmos Circuits and Technology Meeting","volume":"24 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of Bipolar/Bicmos Circuits and Technology Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/BIPOL.1995.493862","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
A 0.35 /spl mu/m logic technology has been developed with high performance transistors and four layers of planarized metal interconnect. A 2.5 V version offers lower power and higher performance. A 3.3 V BiCMOS version has been optimized for compatibility with previous designs implemented in a 0.6 /spl mu/m 3.3 V BiCMOS process. The design process for converting an existing production worthy 0.6 /spl mu/m 3.3 V BiCMOS design is described. The silicon results are described.