F. Hapke, Michael Reese, J. Rivers, A. Over, V. Ravikumar, W. Redemund, Andreas Glowatz, J. Schlöffel, J. Rajski
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引用次数: 57
Abstract
This paper describes a new approach for significantly improving overall defect coverage for CMOS-based designs. We present results from a defect-oriented cell-aware (CA) library characterization and pattern-generation flow and its application to 1,900 cells of a 32-nm technology. The CA flow enabled us to detect cell-internal bridges and opens that caused static, gross-delay, and small-delay defects. We present highvolume production test results from a 32-nm notebook processor to which CA test patterns were applied, including the defect rate reduction in PPM that was achieved after testing 800,000 parts. We also present cell-internal diagnosis and physical failure analysis results from one failing part.