{"title":"A large out-of-plane motion mechanism for optical applications","authors":"J. Tsai, C. Chu, J. Hsieh, W. Fang","doi":"10.1109/OMEMS.2002.1031442","DOIUrl":null,"url":null,"abstract":"Utilizing the high aspect ratio process on [111] Si substrate (BELST process), a large out-of-plane motion actuator that can be applied for MOEMS has been developed. In this design, the combination of vertical comb and robust leverage are exploited to provide an extremely large out-of-plane motion. Moreover, the thickness of the twin-beams torsional bar can also be trimmed to reduce the driving voltage.","PeriodicalId":285115,"journal":{"name":"IEEE/LEOS International Conference on Optical MEMs","volume":"25 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-11-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE/LEOS International Conference on Optical MEMs","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/OMEMS.2002.1031442","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
Utilizing the high aspect ratio process on [111] Si substrate (BELST process), a large out-of-plane motion actuator that can be applied for MOEMS has been developed. In this design, the combination of vertical comb and robust leverage are exploited to provide an extremely large out-of-plane motion. Moreover, the thickness of the twin-beams torsional bar can also be trimmed to reduce the driving voltage.