Innovative tin electrolyte combining high technical standards with significant cost saving potentials

O. Kurtz, P. Kuhlkamp, J. Barthelmes, R. Ruther, Din-Ghee Neoh, Sia-Wing Kok
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Abstract

A new MSA based, fluoroborate-free and foam reduced pure tin electrolyte, Niveostan ™*, has been developed to combine excellent technical performance with significant cost saving potentials. It consists of one additive only which can be easily analyzed by UV. The additive includes already an anti-oxidant to suppress the Sn (IV) formation during processing.The electrolyte provides a unique deposit that exhibits, due to smooth morphology and the large crystal grain size, a lower tendency to whisker formation compared to other electrolytes. In a FIB study this morphology as well as the intermetallic phase creation has been investigated on copper base materials. The electrolyte shows a superior high CD performance and an excellent solderability even after severe storage conditions and a high and reliable reflow performance through its "Big-grained Flat Morphology". The electrolyte also allows cost savings with respect to additive consumption, tin and MSA concentration. The tin and MSA concentrations during operation are comparably low in high speed application and allow significant savings in the overall running costs. The additive is very stable as shown in HPLC and Mass spectrometer analysis and mainly consumed by drag-out. The additive includes already an antioxidant to suppress the Sn (IV) formation very efficiently during processing as shown in a benchmark analysis. Furthermore the electrolyte can be used at room temperature even for high speed application due to its excellent HCD performance.
创新的锡电解液结合了高技术标准和显著的成本节约潜力
一种新的基于MSA的无氟硼酸盐和泡沫还原纯锡电解质Niveostan™*已经开发出来,将卓越的技术性能与显著的成本节约潜力相结合。它仅由一种添加剂组成,易于紫外分析。所述添加剂已包括抗氧化剂以抑制加工过程中锡(IV)的形成。该电解质提供了一种独特的镀层,由于其光滑的形貌和大的晶粒尺寸,与其他电解质相比,其晶须形成的倾向较低。在FIB研究中,研究了铜基材料的这种形态以及金属间相的形成。该电解质具有优异的高CD性能和优异的可焊性,即使在恶劣的存储条件下,也能通过其“大晶粒扁平形貌”获得高可靠的回流性能。电解质还可以节省添加剂消耗、锡和MSA浓度方面的成本。在高速应用中,运行过程中的锡和MSA浓度相对较低,可以显着节省总体运行成本。HPLC和质谱仪分析表明,该添加剂非常稳定,主要以拖排消耗。在基准分析中显示,添加剂中已经含有抗氧化剂,可以在加工过程中非常有效地抑制Sn (IV)的形成。此外,由于其优异的HCD性能,该电解质可以在室温下使用,甚至可以用于高速应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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