The integration of SnO/sub 2/ thin-film onto micro-hotplate for gas sensor applications

Abstract

Anisotropic silicon etching techniques have been widely used in various microsensors to create thermally isolated structures or micro-hotplate (MHP). EDP (Ethylene-diamine-pyrocatechol) is one of the most commonly used anisotropic etchants because of its high selectivity of silicon compared to masking materials such as silicon dioxide. To integrate sensor arrays of various types of SnO/sub 2/ thin-film sensors on the microstructure, we need to find a way to photolithographically pattern the SnO/sub 2/ thin-film. In this paper we report results from such experiments.