External Latchup Characteristics Under Static and Transient Conditions in Advanced Bulk CMOS Technologies

D. Kontos, R. Gauthier, K. Chatty, K. Domanskr, M. Muhammad, C. Seguin, R. Halbach
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引用次数: 11

Abstract

External latchup phenomena in 65nm CMOS technology under transient events are studied. The effect of different design schemes such as injector to detector spacing, detector orientation, guardring protection strategy and also process factors such as wafer resistivity are investigated. The distance of latchup structures from injector devices inside I/O cells is found to be crucial for the latchup robustness of hardware. Guardring protection strategies with second guardring surrounding the latchup structure are proven to be more robust than that of a single guardring. The substrate resistivity can have a very strong impact to the latchup characteristics of hardware. For distances beyond 5mum between latchup structure and injection device is one of the key factors determining the latchup triggering current levels.
先进体CMOS技术静态和瞬态条件下的外锁紧特性
研究了65nm CMOS技术在瞬态事件下的外锁存现象。研究了注入器等不同设计方案对探测器间距、探测器方位、保护策略以及晶片电阻率等工艺因素的影响。锁紧结构与I/O单元内注入装置的距离对硬件的锁紧鲁棒性至关重要。在闭锁结构周围采用二次闭锁的闭锁保护策略被证明比单次闭锁的闭锁保护策略更坚固。衬底电阻率会对硬件的闭锁特性产生非常强烈的影响。闭锁结构与注入装置之间的距离超过5mum是决定闭锁触发电流水平的关键因素之一。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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