Response of a single trap to AC negative Bias Temperature stress

M. Toledano-Luque, B. Kaczer, P. Roussel, T. Grasser, G. Wirth, J. Franco, C. Vrancken, N. Horiguchi, G. Groeseneken
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引用次数: 69

Abstract

We study the properties of a single gate oxide trap subjected to AC Bias Temperature Instability (BTI) stress conditions by means of Time Dependent Defect Spectroscopy. A theory for predicting the occupancy of a single trap after AC stress is developed based on first order kinetics and verified on experimental data. The developed theory can be used to develop circuit simulators and predict time dependent variability.
单阱对交流负偏置温度应力的响应
利用时间相关缺陷谱法研究了单栅氧化阱在交流偏置温度不稳定性(BTI)应力条件下的特性。基于一级动力学,提出了一种预测交流应力作用下单阱占位的理论,并用实验数据进行了验证。所开发的理论可用于开发电路模拟器和预测时变率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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