{"title":"Construction of an in-situ radiation test system for semiconductor materials and devices based on a 4.5 MV accelerator","authors":"Xiuyu Zhang, Yuan Gao, Yifan Zhang, J. Xue","doi":"10.1109/icreed52909.2021.9588711","DOIUrl":null,"url":null,"abstract":"Real-time monitoring the electrical property of semiconductor materials and devices under irradiation can minimize the impact of room temperature annealing and obtain data conveniently. In this work, an in-situ radiation test system was constructed based on a 4.5 MV accelerator and used to measure the electrical property of 4H-SiC under 2 MeV protons irradiation. The results show that the resistance of 4H-SiC increases when the ion fluence increases from 6.37×1013 cm−2 to 8.16×1015 cm−2, showing the system is a powerful tool to investigate the in-situ change of the resistance under MeV ion irradiation.","PeriodicalId":129675,"journal":{"name":"2021 4th International Conference on Radiation Effects of Electronic Devices (ICREED)","volume":"172 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-05-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2021 4th International Conference on Radiation Effects of Electronic Devices (ICREED)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/icreed52909.2021.9588711","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
Real-time monitoring the electrical property of semiconductor materials and devices under irradiation can minimize the impact of room temperature annealing and obtain data conveniently. In this work, an in-situ radiation test system was constructed based on a 4.5 MV accelerator and used to measure the electrical property of 4H-SiC under 2 MeV protons irradiation. The results show that the resistance of 4H-SiC increases when the ion fluence increases from 6.37×1013 cm−2 to 8.16×1015 cm−2, showing the system is a powerful tool to investigate the in-situ change of the resistance under MeV ion irradiation.