Photoluminescence and photoreflectance scanning of silicon-on-insulator materials

H. Hovel
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Abstract

Photoluminescence (PL) and photoreflectance (PR) intensity maps of silicon-on-insulator (SOI) wafers tend to reveal much more than bare silicon. They are often rich in features due to both reflectance variations arising from the optical properties of the multi-layer stack, and to electrical variations across the wafers. PL scanning of these materials reveals many qualitative features useful in tracking uniformity across the wafer and repeatability between wafers from different fabrication runs.<>
绝缘体上硅材料的光致发光和光反射扫描
绝缘体上硅(SOI)晶圆的光致发光(PL)和光反射(PR)强度图往往比裸露的硅揭示更多。由于多层堆叠的光学特性引起的反射率变化以及晶圆上的电变化,它们通常具有丰富的特征。这些材料的PL扫描揭示了许多定性特征,有助于跟踪晶圆上的均匀性和不同制造工艺的晶圆之间的可重复性
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