M. Meneghini, G. Meneghesso, I. Rossetto, J. Bartholomeus, F. Rampazzo, C. de Santi, D. Bisi, E. Zanoni
{"title":"Field-dependent degradation mechanisms in GaN-based HEMTs","authors":"M. Meneghini, G. Meneghesso, I. Rossetto, J. Bartholomeus, F. Rampazzo, C. de Santi, D. Bisi, E. Zanoni","doi":"10.1109/IPFA.2016.7564252","DOIUrl":null,"url":null,"abstract":"GaN-based transistors are emerging as almost ideal devices for application in the power conversion field; however, several factors still limit their performance and reliability. This paper reviews the most common field-dependent degradation mechanisms in GaN-based power transistors. Based on the analysis of commercially-available devices we present data on: (i) the recoverable increase in on-resistance due to the exposure to high drain bias, in the off-state; (ii) the permanent degradation of 650 V transistors submitted to off-state step stress with increasing drain bias. The results obtained on commercially-available devices are critically compared to previous papers on the topic, to provide an extensive overview of the physical origin of the degradation.","PeriodicalId":206237,"journal":{"name":"2016 IEEE 23rd International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)","volume":"30 21 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-07-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE 23rd International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IPFA.2016.7564252","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
GaN-based transistors are emerging as almost ideal devices for application in the power conversion field; however, several factors still limit their performance and reliability. This paper reviews the most common field-dependent degradation mechanisms in GaN-based power transistors. Based on the analysis of commercially-available devices we present data on: (i) the recoverable increase in on-resistance due to the exposure to high drain bias, in the off-state; (ii) the permanent degradation of 650 V transistors submitted to off-state step stress with increasing drain bias. The results obtained on commercially-available devices are critically compared to previous papers on the topic, to provide an extensive overview of the physical origin of the degradation.