Field-dependent degradation mechanisms in GaN-based HEMTs

M. Meneghini, G. Meneghesso, I. Rossetto, J. Bartholomeus, F. Rampazzo, C. de Santi, D. Bisi, E. Zanoni
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引用次数: 2

Abstract

GaN-based transistors are emerging as almost ideal devices for application in the power conversion field; however, several factors still limit their performance and reliability. This paper reviews the most common field-dependent degradation mechanisms in GaN-based power transistors. Based on the analysis of commercially-available devices we present data on: (i) the recoverable increase in on-resistance due to the exposure to high drain bias, in the off-state; (ii) the permanent degradation of 650 V transistors submitted to off-state step stress with increasing drain bias. The results obtained on commercially-available devices are critically compared to previous papers on the topic, to provide an extensive overview of the physical origin of the degradation.
氮化镓基hemt的场依赖降解机制
氮化镓基晶体管在功率转换领域的应用几乎是理想的器件;然而,一些因素仍然限制了它们的性能和可靠性。本文综述了氮化镓基功率晶体管中最常见的场相关退化机制。基于对市售器件的分析,我们提供了以下数据:(i)在关闭状态下,由于暴露于高漏极偏置而导致导通电阻的可恢复增加;(ii)随着漏极偏置的增加,650 V晶体管在失态阶跃应力下的永久退化。在商用设备上获得的结果与先前关于该主题的论文进行了严格的比较,以提供对退化的物理起源的广泛概述。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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