A Methodology for Identifying High Timing Variability Paths in Complex Designs

Abstract

In some complex deep sub-micron designs, the variations in interconnect delay has a significant impact on the production yield of the product. In this paper, we develop a theoretical explanation for the unexpectedly higher process related timing variability shown by long interconnects that are driven by high drive strength gates. This gets even worse due to conventional gate delay variability and other random process effects. Our analysis is supported by actual silicon data and further validated by detailed Monte-Carlo (MC) simulations. Unfortunately, traditional scan based transition delay fault (TDF) timing tests can miss these variability induced delay faults on long interconnects which lies on the critical paths. We propose a methodology to identify high variability paths dominated by such long interconnects, with the aim of developing high quality delay timing tests. Specifically, we develop a heuristic based path selection algorithm to identify potentially slow paths that can contribute to test escapes in production. We further extend our approach to generate high quality delay timing tests for the target paths using the proposed "three pass" method.