Process windows for convenient in-process monitoring of oxide and polysilicon etches

Abstract

Process monitor window test structures are developed to standardize and to facilitate the in-process monitoring of oxide and polysilicon etches. With training, the operator can easily monitor and tune the etching process visually using these process windows. If a standard set of process monitor structures is developed for each technology and placed on all reticle sets using that technology, operators are provided with an easily recognized place to make their measurements. These windows standardize the measurement taking process, thereby reducing errors and improving quality.<>