Investigating Neutron-Induced Single Event Transient Characteristics by TCAD Simulations in 65 nm Technology and Below

C. Peng, Z. Lei, Zhangang Zhang, Y. En, Yun Huang
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引用次数: 2

Abstract

The neutron-induced secondary ions can cause single event effects through direct ionization, while the LET values of the secondary ions are quite lower than heavy ions in space. Monte Carlo simulation results show that although the maximum LET of secondary ions produced by different energy neutrons incident into the circuit can reach 25.6 MeV-cm2/mg, 98% of the secondary ions have LET values below 16 MeV-cm2/mg. This may lead to different charge collection mechanisms and single event transient (SET) characteristics for neutron. In this paper, the charge collection mechanisms of neutron secondary ions in a single 65 nm planar bulk transistor are studied through 3D TCAD simulations. The neutron-induced SET characteristics in planar bulk transistor, UTBB FDSOI and bulk/SOI FinFET are also compared. Based on the simulation results, UTBB FDSOI shows the best single event effect immunity compared with planar bulk transistor, bulk FinFET and SOI FinFET under the same technology node.
用TCAD模拟研究65纳米及以下工艺中中子诱导的单事件瞬态特性
中子诱导的二次离子可以通过直接电离引起单事件效应,而二次离子的LET值在空间上远低于重离子。Monte Carlo模拟结果表明,虽然不同能量中子入射电路产生的二次离子的最大LET值可达25.6 MeV-cm2/mg,但98%的二次离子的LET值低于16 MeV-cm2/mg。这可能导致中子不同的电荷收集机制和单事件瞬态(SET)特性。本文通过三维TCAD模拟研究了65 nm平面体晶体管中中子二次离子的电荷收集机制。比较了平面块状晶体管、UTBB FDSOI和块状/SOI FinFET的中子诱导SET特性。仿真结果表明,在相同技术节点下,UTBB FDSOI与平面体体晶体管、体体FinFET和SOI FinFET相比具有最佳的单事件抗扰度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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