Retention, disturb and variability improvements enabled by local chemical-potential tuning and controlled Hour-Glass filament shape in a novel W\WO3\Al2O3\Cu CBRAM
L. Goux, A. Belmonte, U. Celano, J. Woo, S. Folkersma, C. Y. Chen, A. Redolfi, A. Fantini, R. Degraeve, S. Clima, W. Vandervorst, M. Jurczak
{"title":"Retention, disturb and variability improvements enabled by local chemical-potential tuning and controlled Hour-Glass filament shape in a novel W\\WO3\\Al2O3\\Cu CBRAM","authors":"L. Goux, A. Belmonte, U. Celano, J. Woo, S. Folkersma, C. Y. Chen, A. Redolfi, A. Fantini, R. Degraeve, S. Clima, W. Vandervorst, M. Jurczak","doi":"10.1109/VLSIT.2016.7573404","DOIUrl":null,"url":null,"abstract":"We optimize a novel W\\WO3\\Al2O3\\Cu CBRAM cell allowing excellent control of Hour-Glass (HG) shaped Conductive Filament (CF), improving switching variability, disturb and retention at low current. We evidence for the first time the critical impact of the Cu chemical potential close to the HG constriction on state retention.","PeriodicalId":129300,"journal":{"name":"2016 IEEE Symposium on VLSI Technology","volume":"69 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"10","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE Symposium on VLSI Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.2016.7573404","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 10
Abstract
We optimize a novel W\WO3\Al2O3\Cu CBRAM cell allowing excellent control of Hour-Glass (HG) shaped Conductive Filament (CF), improving switching variability, disturb and retention at low current. We evidence for the first time the critical impact of the Cu chemical potential close to the HG constriction on state retention.