2003 8th International Symposium on Plasma- and Process-Induced Damage. (Cat. No.03TH8669)

Abstract

The following topics are dealt with: process induced damage in CMOS; plasma etching processes; gate charging effect; plasma induced damage; scaling effects; ultrathin dielectrics; plasma-induced charging; reliability issues; ion implantation technology; electron shading damage; gate oxide quality; damage monitoring; IC interconnection designs; plasma equipment trends; and CMOS downscaling.