State-of-the-art and trends in 3D IC/Si integrations and WLP

J. Lau
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引用次数: 3

Abstract

Moore's law has been the most powerful driver for the development of the microelectronic industry. This law emphasizes on lithography scaling and integration (in 2D) of all functions on a single chip, perhaps through system-on-chip (SoC). On the other hand, the integration of all these functions can be achieved through system-in-package (SiP) or, ultimately, 3D IC/Si integration, which is a very complicate subject. It involves component and system designs, FAB, packaging assembly and testing, material suppliers, and equipment suppliers. The key enabling technologies for 3D IC integration are, e.g., electrical, thermal, and mechanical designs and tests, known good die (KGD), TSV (through silicon via) forming and filling, wafer thinning and handling, thin chip strength measurement and improving, lead-free microbump forming and assembly, low temperature C2W and W2W bonding, and thermal management. In this course, all these enabling technologies (except electrical) will be discussed. Most of the materials are based on the technical papers published within the past 3 years by others and the instructor.
3D IC/Si集成和WLP的最新技术和趋势
摩尔定律一直是微电子工业发展的最强大推动力。该定律强调光刻缩放和集成(2D)在单个芯片上的所有功能,可能通过片上系统(SoC)。另一方面,所有这些功能的集成可以通过系统级封装(SiP)来实现,或者最终通过3D IC/Si集成来实现,这是一个非常复杂的主题。它涉及组件和系统设计、FAB、封装组装和测试、材料供应商和设备供应商。3D集成电路的关键使能技术包括电气、热和机械设计和测试、已知优良模具(KGD)、TSV(通过硅孔)成型和填充、晶圆减薄和处理、薄芯片强度测量和改进、无铅微凸点成型和组装、低温C2W和W2W键合以及热管理。在本课程中,将讨论所有这些使能技术(电气除外)。大部分材料是基于近3年内他人和讲师发表的技术论文。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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