{"title":"Resolution of missing silicide layer on P-type MOSFET caused by water droplet","authors":"Siew Mei Teo, Khairul Aiman Yusof, N. Hat","doi":"10.1109/IPFA.2016.7564271","DOIUrl":null,"url":null,"abstract":"Some of the wafer fabrication defects are unable to be screened out during final test. It is inevitable that these defective units will reach customer. This paper aims to discuss on the failure analysis approach and resolution of wafer fabrication defect, missing silicide layer.","PeriodicalId":206237,"journal":{"name":"2016 IEEE 23rd International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)","volume":"13 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE 23rd International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IPFA.2016.7564271","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Some of the wafer fabrication defects are unable to be screened out during final test. It is inevitable that these defective units will reach customer. This paper aims to discuss on the failure analysis approach and resolution of wafer fabrication defect, missing silicide layer.