Scan Diagnosis and Its Successful Industrial Applications

Wu Yang, Wu-Tung Cheng, Yu Huang, Martin Keim, R. Klingenberg
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引用次数: 0

Abstract

As technologies move below 130nm, the IC industry has seen a significant change in defect type encountered. Feature-related defects are becoming more prevalent than particle-driven defects in nanometer designs. The process and design variances require checks for the design-for-manufacturing (DFM) issues in order to achieve a high yield. Scan diagnosis targeted for the nanometer designs can provide quick, accurate and reliable failure information from the production environment. The ranked, fault classified and physically linked scan diagnosis results can, in turn, provide the guides for DFM checks. High volume diagnosis provides data to yield management system for statistical analysis. This presentation briefly explains the technology behind the scene, discusses scan diagnosis applications and shows the results.
扫描诊断及其成功的工业应用
随着技术发展到130nm以下,IC行业遇到的缺陷类型发生了重大变化。在纳米设计中,与特征相关的缺陷比粒子驱动的缺陷更为普遍。工艺和设计差异需要检查为制造而设计(DFM)问题,以实现高产量。针对纳米设计的扫描诊断可以从生产环境中提供快速、准确和可靠的故障信息。分级、故障分类和物理链接的扫描诊断结果可以为DFM检查提供指导。高容量诊断为产量管理系统提供数据进行统计分析。本报告简要介绍了幕后的技术,讨论了扫描诊断的应用并展示了结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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