{"title":"Measurements and simulations of breakdown phenomena in a voltage-scalable smart power complementary BiCMOS process","authors":"R. Ryter, R. Zingg, W. Fichtner","doi":"10.1109/BIPOL.1994.587879","DOIUrl":null,"url":null,"abstract":"Good agreement between 2-D simulations and experiments of device parameters, especially breakdown voltages, allows voltage scaling against cutoff frequency. Measurements and simulations of breakdown phenomena in vertical NPN transistors fabricated with a voltage-scalable smart power complementary BiCMOS process show that the open base and the open emitter breakdown occur at different spatial positions in the device structure.","PeriodicalId":373721,"journal":{"name":"Proceedings of IEEE Bipolar/BiCMOS Circuits and Technology Meeting","volume":"109 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1994-10-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of IEEE Bipolar/BiCMOS Circuits and Technology Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/BIPOL.1994.587879","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Good agreement between 2-D simulations and experiments of device parameters, especially breakdown voltages, allows voltage scaling against cutoff frequency. Measurements and simulations of breakdown phenomena in vertical NPN transistors fabricated with a voltage-scalable smart power complementary BiCMOS process show that the open base and the open emitter breakdown occur at different spatial positions in the device structure.