J. Castillo, D. Mavis, P. Eaton, M. Sibley, Donald Elkins, Rich Floyd
{"title":"An automated approach to isolate dominant SER susceptibilities in microcircuits","authors":"J. Castillo, D. Mavis, P. Eaton, M. Sibley, Donald Elkins, Rich Floyd","doi":"10.1109/IRPS.2011.5784595","DOIUrl":null,"url":null,"abstract":"With the ever decreasing feature sizes of modern integrated circuits (IC), new test and analysis approaches are needed to isolate dominant soft error rate (SER) susceptibilities. A new test capability which provides SER raster scanning of microcircuits with a collimated heavy-ion beam, having spatial isolation as small as 10 microns, is presented. The system termed the Milli-Beam™ provides, through post processing, three-dimensional surface plots showing the location of error counts over an entire IC. A new cross section measurement technique that accounts for beam variations and uncertainties independent of laboratory dosimetry is also presented.","PeriodicalId":242672,"journal":{"name":"2011 International Reliability Physics Symposium","volume":"93 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-04-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 International Reliability Physics Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS.2011.5784595","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 6
Abstract
With the ever decreasing feature sizes of modern integrated circuits (IC), new test and analysis approaches are needed to isolate dominant soft error rate (SER) susceptibilities. A new test capability which provides SER raster scanning of microcircuits with a collimated heavy-ion beam, having spatial isolation as small as 10 microns, is presented. The system termed the Milli-Beam™ provides, through post processing, three-dimensional surface plots showing the location of error counts over an entire IC. A new cross section measurement technique that accounts for beam variations and uncertainties independent of laboratory dosimetry is also presented.