R. Menozzi, G. Sozzi, E. Tediosi, D. Dieci, C. Lanzieri, C. Canali
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引用次数: 3
Abstract
This works shows high-field degradation data measured on AlGaAs/GaAs HFETs under different stress bias conditions. The aim is at extracting indications on the relevant factors accelerating the gradual degradation of the HFETs under hot-electron and impact ionization conditions. Popular acceleration laws used for MOSFETs are applied, and numerical simulations are used as an aid for the physical interpretation of the results.