Synthesizing high-performance compliant stroke amplification systems for MEMS

S. Kota, J. Hetrick, Zhe Li, S. Rodgers, T. Krygowski
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引用次数: 41

Abstract

We have recently designed, fabricated, demonstrated a new class of compliant stroke amplification mechanisms that are exceptionally well suited for MEMS applications. Manufactured in Sandia's advanced 5-level surface micromachining technology known as SUMMiT-V, these computer generated structures provide high work and area efficiency in designs that are highly compatible with the fabrication process. The actual devices display outstanding yield, robustness, endurance, and resistance to surface adhesion effects during the final release process. One device has been driven to a 20-/spl mu/m output displacement at resonance for more than 10/sup 10/ cycles with no apparent fatigue. This paper focuses on the unique methodology employed to design and analyze these compliant stroke amplification systems. The same approach, however, can be used to design many other compliant structures for fabrication in a MEMS technology. Compliance in design leads to creation of jointless, no-assembly, monolithic mechanical device.
用于MEMS的高性能柔性行程放大系统的合成
我们最近设计,制造,展示了一类非常适合MEMS应用的新型柔性冲程放大机构。这些计算机生成的结构采用桑迪亚先进的5级表面微加工技术(称为SUMMiT-V)制造,在设计中提供高工作效率和面积效率,与制造工艺高度兼容。实际的器件在最终释放过程中显示出出色的良率、坚固性、耐久性和对表面粘附效应的抵抗力。一个装置在共振时的输出位移达到20-/spl mu/m,超过10/sup /个循环,没有明显的疲劳。本文重点介绍了设计和分析这些柔性冲程放大系统的独特方法。然而,同样的方法可以用于设计许多其他符合MEMS技术制造的结构。设计中的顺应性导致了无接缝、无装配、整体机械装置的创建。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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