Characterization of Resistivity and Breakdown Field in Fe-Doped Semi-Insulating Gan Substrates

A. Aoai, K. Suzuki, J. Asubar, H. Tokuda, K. Nojima, N. Ishibashi, N. Okada, K. Tadatomo, M. Kuzuhara
{"title":"Characterization of Resistivity and Breakdown Field in Fe-Doped Semi-Insulating Gan Substrates","authors":"A. Aoai, K. Suzuki, J. Asubar, H. Tokuda, K. Nojima, N. Ishibashi, N. Okada, K. Tadatomo, M. Kuzuhara","doi":"10.1109/IMFEDK.2018.8581960","DOIUrl":null,"url":null,"abstract":"In this work, we study the breakdown electric field and resistivity of Fe-doped semi-insulating GaN substrates with various Fe doping concentrations. The substrate with Fe doping concentration of 4×10<sup>20</sup> cm<sup>−3</sup> exhibited an effective lateral breakdown field of 2 MV/cm with a resistivity of more than 10<sup>12</sup>Ωcm. It was found that increasing the Fe concentration was effective to enhance the resistivity and effective lateral breakdown electric field.","PeriodicalId":434417,"journal":{"name":"2018 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK)","volume":"18 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMFEDK.2018.8581960","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

In this work, we study the breakdown electric field and resistivity of Fe-doped semi-insulating GaN substrates with various Fe doping concentrations. The substrate with Fe doping concentration of 4×1020 cm−3 exhibited an effective lateral breakdown field of 2 MV/cm with a resistivity of more than 1012Ωcm. It was found that increasing the Fe concentration was effective to enhance the resistivity and effective lateral breakdown electric field.
掺铁半绝缘Gan衬底电阻率和击穿场的表征
本文研究了不同铁掺杂浓度下掺铁半绝缘GaN衬底的击穿电场和电阻率。当Fe掺杂浓度为4×1020 cm−3时,衬底的有效横向击穿场为2 MV/cm,电阻率大于1012Ωcm。结果表明,增加铁浓度可有效提高电极的电阻率和有效侧向击穿电场。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信