ESD protection for sub-45 nm MugFET technology

M. Natarajan, S. Thijs, D. Trémouilles, D. Linten, N. Collaert, M. Jurczak, G. Groeseneken
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引用次数: 2

Abstract

From the design point of view, while such technology options may result in increased transistor performance, the ability to achieve sufficient product reliability is to be addressed. Among the industry accepted reliability requirements, electrostatic discharge (ESD) reliability assessment is the focus of this work.
45纳米以下MugFET技术的ESD保护
从设计的角度来看,虽然这种技术选项可能会导致晶体管性能的提高,但实现足够产品可靠性的能力有待解决。在业界公认的可靠性要求中,静电放电(ESD)可靠性评估是本工作的重点。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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