Reliability investigation of metal-semiconductor diodes in an E/D pHEMT process

S. Somisetty, P. Ersland, Xinxing Yang
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Abstract

Metal-semiconductor diodes may be realized by various techniques, depending on application and processing technology. MIA-COM has recently developed an Enhancement/Depletion (EID) pHEMT process, used primarilyfor control circuits. In this process, both D-mode and E-mode FETs are configured as diodes, to serve functions such as voltage level shifting in digital logic circuits. We report here on a reliability study of E-mode FETs configured as diodes, and subjected to both high temperature and forward bias accelerated stress. Different failure modes observed during accelerated life tests of two diode configurations are discussed, and the causesfor aging are analyzed
金属半导体二极管在E/D pHEMT工艺中的可靠性研究
根据应用和加工技术的不同,金属半导体二极管可以通过各种技术来实现。MIA-COM最近开发了一种增强/耗尽(EID) pHEMT工艺,主要用于控制电路。在这个过程中,d模和e模场效应管都被配置为二极管,以服务于数字逻辑电路中的电压电平转换等功能。我们在这里报告了一项可靠性研究,该研究将e型场效应管配置为二极管,并承受高温和正向偏置加速应力。讨论了两种二极管加速寿命试验中观察到的不同失效模式,并分析了老化的原因
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