A 32nm high-k and metal-gate anti-fuse array featuring a 1.01µm2 1T1C bit cell

S. Kulkarni, S. Pae, Zhanping Chen, W. Hafez, B. Pedersen, A. Rahman, T. Tong, U. Bhattacharya, C. Jan, K. Zhang
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引用次数: 14

Abstract

A 1 k-bit high-density OTP (One Time Programmable)-ROM array featuring a new anti-fuse memory is presented using 32nm high-k (HK) and metal-gate (MG) CMOS process. Our 32nm HK+MG SOC process technology enables smallest reported one-transistor one-capacitor (1T1C) bit cell area measuring 1.01μm2. The 32-row by 32-column array with a programmable sensing scheme demonstrates yield exceeding 99.9% and robust reliability.
32nm高k和金属栅防熔丝阵列,具有1.01µm2 1T1C位单元
采用32nm高k (HK)和金属栅(MG) CMOS工艺,提出了一种具有新型防熔丝存储器的1k位高密度OTP(一次性可编程)-ROM阵列。我们的32nm HK+MG SOC工艺技术可实现最小的单晶体管单电容(1T1C)位单元面积,为1.01μm2。采用可编程传感方案的32行32列阵列的良率超过99.9%,可靠性高。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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