{"title":"No pumping at 450°C with electrodeposited copper TSV","authors":"K. Kondo","doi":"10.1109/ECTC.2016.337","DOIUrl":null,"url":null,"abstract":"1.The additive A shows no pumping with electrodeposited copper TSV. 2. The resistivity of electrodeposited copper TSV after 450°C annealing for the wiring is only 1.09 of conventional electrodeposited copper. 3.The 34% TEC reduction has been realized at 230°C for solder reflow temperature for PCB. The 34% reduction has been obtained after the second annealing after 200°C, 60min with the additive B. 4.The resistivity of PCB copper after annealing is only 1.32 of conventional electrodeposited copper.","PeriodicalId":343912,"journal":{"name":"2016 International Conference on Electronics Packaging (ICEP)","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-08-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 International Conference on Electronics Packaging (ICEP)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ECTC.2016.337","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
1.The additive A shows no pumping with electrodeposited copper TSV. 2. The resistivity of electrodeposited copper TSV after 450°C annealing for the wiring is only 1.09 of conventional electrodeposited copper. 3.The 34% TEC reduction has been realized at 230°C for solder reflow temperature for PCB. The 34% reduction has been obtained after the second annealing after 200°C, 60min with the additive B. 4.The resistivity of PCB copper after annealing is only 1.32 of conventional electrodeposited copper.