DC Biased Field Plate RESURF for Further RDSON Reduction of LDMOS Transistors

Wendi Wang, Z. Shen, I. Brown
{"title":"DC Biased Field Plate RESURF for Further RDSON Reduction of LDMOS Transistors","authors":"Wendi Wang, Z. Shen, I. Brown","doi":"10.1109/LAEDC58183.2023.10208286","DOIUrl":null,"url":null,"abstract":"A new RESURF variant concept termed DC Biased Field Plate RESURF (BFP-RESURF) is proposed and studied through TCAD simulation in this work. The new LDMOS device structure features multiple field plates over the drift region that are biased at constant voltages. Significant reduction of ${\\mathrm {R}}_{{\\mathrm {DSON}}}$ can be achieved by a more ideal electric field profile and an accumulation channel induced by the BFPs. Simulation study indicates that the new BFP-LDMOS offers a specific ${\\mathrm {R}}_{{\\mathrm {DSON}}}$ of 58 m$\\Omega$. m${\\mathrm {}}m ^{2}$ comparing to 91 m$\\Omega$. m${\\mathrm {m}}^{2}$ of the conventional LDMOS, a 1.6X reduction at a BV of 100V. The concept could be further extended to a wider range of BV ratings, the ${\\mathrm {R}}_{{\\mathrm {DSON}}}$ benefit becomes more pronounced as BV goes higher. The switching performance shows no obvious difference between the BFP and standard LDMOS. The BFP-RESURF concept is completely compatible with conventional BCDMOS processes and scalable over a wide range of voltage ratings.","PeriodicalId":151042,"journal":{"name":"2023 IEEE Latin American Electron Devices Conference (LAEDC)","volume":"15 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-07-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2023 IEEE Latin American Electron Devices Conference (LAEDC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/LAEDC58183.2023.10208286","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

A new RESURF variant concept termed DC Biased Field Plate RESURF (BFP-RESURF) is proposed and studied through TCAD simulation in this work. The new LDMOS device structure features multiple field plates over the drift region that are biased at constant voltages. Significant reduction of ${\mathrm {R}}_{{\mathrm {DSON}}}$ can be achieved by a more ideal electric field profile and an accumulation channel induced by the BFPs. Simulation study indicates that the new BFP-LDMOS offers a specific ${\mathrm {R}}_{{\mathrm {DSON}}}$ of 58 m$\Omega$. m${\mathrm {}}m ^{2}$ comparing to 91 m$\Omega$. m${\mathrm {m}}^{2}$ of the conventional LDMOS, a 1.6X reduction at a BV of 100V. The concept could be further extended to a wider range of BV ratings, the ${\mathrm {R}}_{{\mathrm {DSON}}}$ benefit becomes more pronounced as BV goes higher. The switching performance shows no obvious difference between the BFP and standard LDMOS. The BFP-RESURF concept is completely compatible with conventional BCDMOS processes and scalable over a wide range of voltage ratings.
进一步降低LDMOS晶体管RDSON的直流偏置场极板重构
本文提出了直流偏置场板(bbp -RESURF)的概念,并通过TCAD仿真进行了研究。新的LDMOS器件结构具有在恒定电压下偏置的漂移区域上的多个场极板。通过更理想的电场分布和由BFPs诱导的积累通道,可以显著降低${\mathrm {R}}_{{\mathrm {DSON}}}$。仿真研究表明,新型BFP-LDMOS可提供5800万$\Omega$的特定${\ mathm {R}}_{{\ mathm {DSON}}}$。m${\ mathm {}}m ^{2}$与91 m$\Omega$比较。m${\mathrm {m}}^{2}$,在BV为100V时降低了1.6倍。这个概念可以进一步扩展到更大范围的BV评级,随着BV的增加,${\mathrm {R}}_{\mathrm {DSON}}}$的好处变得更加明显。BFP与标准LDMOS的交换性能无明显差异。bbp - resurf概念与传统的BCDMOS工艺完全兼容,并可在广泛的额定电压范围内扩展。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信