The role of Cu-Al IMC coverage and aluminum splash in Pd-copper wire HAST performance

Ming-chuan Han, Jun Li, B. Yan, J. Yao, M. Song
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引用次数: 4

Abstract

Copper wire bonding process has become popular interconnection process over gold because of its obvious cost advantages as well as lower electrical resistivity and good thermal conductivity. Recently, Pd-coated Cu wire is emerging as an alternative to bonding with bare Cu wire to prevent copper oxidation during the bonding and improve manufacturability [1]. Compared to bare copper, Pd copper wire shows robust bonding process, especially offers better 2nd bond performance and better reliability. Although copper wire bonding technology has been already at the phase of mass production, the discussion about reliability failures is still ongoing. The occurrence of the related open circuit failures are often reported as a consequence of humidity related stress test, Biased-HAST and PCT[2]. It is a specially challenge for the device with thicker bond pad metal. Most of open failure is caused by galvanic corrosion of one or more of intermetallic layers formed at the Cu-Al interface post HAST or Auto clave test. In this paper, a CMOS65 nm low k device with 47um fine pitch and 2.8um bond pad metal thickness was selected to establish indicator to pass HAST for the device with thicker bond pad metal. First, the distribution of the Pd on the surface was investigated under EFO parameter combination by HPM, SEM and EDX. Next, Capillary feature design was studied to shrink aluminum splash. Capillary with different MTA and chamfer angle were screened to know how these factors affect aluminum splash. Pro-stitch function of K&S ICONN also was studied to improve 2nd bond performance, bare copper as control. Third, the 1st bond parameters were optimized using selected capillary aimed to improve aluminum splash. Critical responses such as Ball size, Ball height, wire pull strength, ball shear strength, and stitch pull strength, cratering, IMC coverage and aluminum splash and remnant were studied to understand effect of Pd copper. DOE (Design of Experiment) and RSM (response surface methodology) was used to optimize the wire bond process. Thermal aging test coupled with wire pull and ball shear test with recording failure mode were studied. Last, four cells were built to be subject to HAST. The four cells were determined based on previous pass and failure, it covers different bonder platform, difference 1st bonding concept and different IMC coverage and aluminum splash. HAST& UHST pass rate, Ball shear, IMC coverage and aluminum as key wire bond response were studied. Studied shows Ball shear and IMC coverage are effective indicator to pass HAST and UHAST stress test. IMC coverage play main role in addressing moisture induced corrosion issue. Regarding IMC coverage, big void in ball center is not preferred and should be avoided. The gap between ball periphery and pad should be considered seriously.
Cu-Al IMC覆盖和铝溅射对pd -铜线HAST性能的影响
铜线键合工艺因其具有明显的成本优势以及较低的电阻率和良好的导热性,已成为取代金的热门互连工艺。最近,钯包覆铜线作为一种替代裸铜线的结合方式出现,以防止铜在结合过程中氧化并提高可制造性[1]。与裸铜相比,Pd铜线的键合过程更加牢固,特别是具有更好的二次键合性能和可靠性。虽然铜线键合技术已进入量产阶段,但其可靠性失效的讨论仍在进行中。相关开路故障的发生经常被报道为与湿度相关的应力测试、bias - hast和PCT的结果[2]。对于具有较厚粘结垫金属的设备来说,这是一个特别的挑战。大多数露天破坏是由于Cu-Al界面上形成的一个或多个金属间层在HAST或Auto clave试验后的电偶腐蚀引起的。本文选择47um细间距、2.8um键垫金属厚度的CMOS65 nm低k器件,建立键垫金属厚度较厚器件通过HAST的指标。首先,利用HPM、SEM和EDX研究了复合EFO参数下Pd在表面的分布;其次,研究了收缩铝飞溅的毛细管特征设计。筛选不同MTA和倒角的毛细管,了解这些因素对铝飞溅的影响。以裸铜为对照,研究了K&S ICONN的预缝功能,以提高二次键合性能。第三,采用所选毛细管对第一键参数进行优化,以改善铝溅射。研究了球尺寸、球高度、拉丝强度、球抗剪强度、针拉强度、破洞、IMC覆盖率、铝飞溅和残余等关键响应,以了解钯铜的影响。采用试验设计(DOE)和响应面法(RSM)对金属丝键合工艺进行了优化。热老化试验与记录破坏模式的拉丝和球剪试验相结合进行了研究。最后,构建四个细胞进行HAST测试。这四个单元是根据之前的通过和失败情况确定的,它涵盖了不同的粘结平台,不同的一级粘结概念,不同的IMC覆盖范围和铝飞溅。研究了hst和UHST通过率、球剪率、IMC覆盖率和铝作为关键线材粘结响应。研究表明,球剪和IMC覆盖率是通过HAST和UHAST应力测试的有效指标。IMC覆盖在解决湿气腐蚀问题中起着重要作用。对于IMC覆盖,球中心的空隙不宜过大,应尽量避免。应认真考虑球外围与垫之间的间隙。
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