R. Feyaerts, L. Vandamme, G. Trefán, M.C.J.C.M. Kramer, C. Zellweger
{"title":"Bulk and contact 1/f noise in GaN TLM structures","authors":"R. Feyaerts, L. Vandamme, G. Trefán, M.C.J.C.M. Kramer, C. Zellweger","doi":"10.1109/ESSDERC.2001.195274","DOIUrl":null,"url":null,"abstract":"We measure the contact resistance and 1/f noise on n-type GaN samples grown by various vapour phase epitaxy (VPE) technologies. Contacts are made in a linear transmission line geometry (TLM). In some samples the metal semiconductor contact noise dominates. This 1/f noise spans over 4 decades. In other samples the bulk noise dominates. This 1/f noise is described by the empirical relation","PeriodicalId":345274,"journal":{"name":"31st European Solid-State Device Research Conference","volume":"12 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-09-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"31st European Solid-State Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESSDERC.2001.195274","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
We measure the contact resistance and 1/f noise on n-type GaN samples grown by various vapour phase epitaxy (VPE) technologies. Contacts are made in a linear transmission line geometry (TLM). In some samples the metal semiconductor contact noise dominates. This 1/f noise spans over 4 decades. In other samples the bulk noise dominates. This 1/f noise is described by the empirical relation