{"title":"Advanced FET Design Using High-k Gate Dielectric and Characterization for Low-Power VLSI","authors":"P. Vimala, T. Samuel","doi":"10.1201/9781003121589-6","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":331396,"journal":{"name":"High-k Materials in Multi-Gate FET Devices","volume":"43 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-07-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"High-k Materials in Multi-Gate FET Devices","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1201/9781003121589-6","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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