{"title":"Deuterium process of CMOS devices: new phenomena and dramatic improvement","authors":"Zhi Chen, Jinju Lee, J. Lyding, K. Hess","doi":"10.1109/VLSIT.1998.689248","DOIUrl":null,"url":null,"abstract":"When CMOS devices were annealed in D/sub 2/ in instead of H/sub 2/, the slope, n, of the degradation power law is smaller than that for the H/sub 2/ processed devices. At higher process temperature (480/spl deg/C), the power index, n, becomes voltage dependent. This results in dramatic enhancement of life time (over 10/sup 6/ times). 10-30% higher channel electrical field can be applied to the D/sub 2/ annealed devices.","PeriodicalId":402365,"journal":{"name":"1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-06-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.1998.689248","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
When CMOS devices were annealed in D/sub 2/ in instead of H/sub 2/, the slope, n, of the degradation power law is smaller than that for the H/sub 2/ processed devices. At higher process temperature (480/spl deg/C), the power index, n, becomes voltage dependent. This results in dramatic enhancement of life time (over 10/sup 6/ times). 10-30% higher channel electrical field can be applied to the D/sub 2/ annealed devices.