Deuterium process of CMOS devices: new phenomena and dramatic improvement

Zhi Chen, Jinju Lee, J. Lyding, K. Hess
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Abstract

When CMOS devices were annealed in D/sub 2/ in instead of H/sub 2/, the slope, n, of the degradation power law is smaller than that for the H/sub 2/ processed devices. At higher process temperature (480/spl deg/C), the power index, n, becomes voltage dependent. This results in dramatic enhancement of life time (over 10/sup 6/ times). 10-30% higher channel electrical field can be applied to the D/sub 2/ annealed devices.
CMOS器件的氘制程:新现象和显著改进
当CMOS器件以D/sub - 2/ in代替H/sub - 2/ in退火时,衰减幂律的斜率n小于H/sub - 2/ in处理的器件。在较高的工艺温度下(480/压升度/C),功率指数n与电压相关。这大大提高了寿命(超过10/sup / 6/ times)。10-30%的高通道电场可应用于D/sub /退火器件。
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