{"title":"Substrate Isolation Options Effect on HV Latch-up","authors":"D. Marreiro, V. Vashchenko","doi":"10.23919/EOS/ESD.2018.8509741","DOIUrl":null,"url":null,"abstract":"The novel wafer-level test method is used to study HV latch-up specifics through comparisons between two most common power analog processes - Extended CMOS and BCD. The dependence of the critical injector-victim voltage upon the injector-victim spacing is analyzed toward practically useful high-and low-side injection HV latch-up regularities.","PeriodicalId":328499,"journal":{"name":"2018 40th Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD)","volume":"91 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 40th Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/EOS/ESD.2018.8509741","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7
Abstract
The novel wafer-level test method is used to study HV latch-up specifics through comparisons between two most common power analog processes - Extended CMOS and BCD. The dependence of the critical injector-victim voltage upon the injector-victim spacing is analyzed toward practically useful high-and low-side injection HV latch-up regularities.