“Front-end-ization” of the back-end

Rajiv Roy
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引用次数: 1

Abstract

The trend towards 3D stacking and Cu Pillar bumping has significantly altered the requirements for manufacturing tools in the back-end. Techniques and processes are beginning to resemble the front-end of 20 years ago but with updated and more affordable cost-of ownership capabilities. As an example, steppers would have been unheard of in the back-end. Today steppers are critical to achieve yield for devices ranging from fan-out wafer level chip scale packaging to Cu Pillar bumping. Re-distribution layer pitch has shrunk dramatically over the last few years, customers are demanding less than 5μm spacing and 5μm width. It is impossible to maintain effective CD over a 300mm wafer without a stepper on a three layer process. On wafer requirements, 0.5μm resolution inspection was state of the art 25 years ago. Today, fine pitch Cu Pillar is driving inspection of Cu bumps at similar resolution but at a significantly higher throughput and a much lower Cost-of-ownership (COO). Other traditional Front-end capabilities such as Metrology and Advanced Process Control (APC) that are being adopted by the back-end will also be discussed.
后端“前端化”
3D堆叠和铜柱碰撞的趋势显著改变了对后端制造工具的要求。技术和流程开始类似于20年前的前端,但具有更新和更可负担的拥有成本能力。例如,步进器在后端是闻所未闻的。今天,步进器对于实现从扇形晶圆级芯片规模封装到铜柱碰撞等器件的成品率至关重要。再分配层间距在过去几年中急剧缩小,客户要求小于5μm的间距和5μm的宽度。如果没有三层工艺的步进器,在300mm晶圆上保持有效的CD是不可能的。在晶圆要求方面,0.5μm分辨率的检测在25年前是最先进的。如今,细螺距Cu柱可以以类似的分辨率检测Cu凸点,但吞吐量明显提高,拥有成本(COO)也大大降低。其他传统的前端功能,如计量和高级过程控制(APC),正在被后端采用也将讨论。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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