High-Mobility Single-Crystalline WO3 Epiaxial Films Grown on LSAT Substrates

H. Mito, Ryota Nakamura, K. Koike, S. Sasa, M. Yano, Shintaro Kobayashi, K. Inaba
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引用次数: 1

Abstract

MBE growth of WO3 on (100) LSAT substrates is reported. It is revealed that the initial WO3 layer crystallizes in the cubic WO3 structure although the lattice constant in the growth direction is shrunken due to the coherent growth. This cubic structure is relaxed and becomes close to the orthorhombic WO3 structure with increasing thickness. The electron mobility in a 5 nm thick film was as large as 560 cm2/Vs while it decreased to the typical vale of bulk crystals of about 10 cm2/Vs in the thicker films more than 30 nm.
在LSAT衬底上生长的高迁移率单晶WO3外轴薄膜
报道了WO3在(100)LSAT衬底上的MBE生长。结果表明,初始WO3层的结晶结构为立方WO3结构,但生长方向的晶格常数由于相干生长而减小。随着厚度的增加,这种立方结构趋于松弛,接近正交WO3结构。在5 nm厚的薄膜中,电子迁移率高达560 cm2/Vs,而在大于30 nm厚的薄膜中,电子迁移率降至典型的体晶体值约10 cm2/Vs。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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