H. Mito, Ryota Nakamura, K. Koike, S. Sasa, M. Yano, Shintaro Kobayashi, K. Inaba
{"title":"High-Mobility Single-Crystalline WO3 Epiaxial Films Grown on LSAT Substrates","authors":"H. Mito, Ryota Nakamura, K. Koike, S. Sasa, M. Yano, Shintaro Kobayashi, K. Inaba","doi":"10.1109/IMFEDK.2018.8581977","DOIUrl":null,"url":null,"abstract":"MBE growth of WO<inf>3</inf> on (100) LSAT substrates is reported. It is revealed that the initial WO<inf>3</inf> layer crystallizes in the cubic WO<inf>3</inf> structure although the lattice constant in the growth direction is shrunken due to the coherent growth. This cubic structure is relaxed and becomes close to the orthorhombic WO<inf>3</inf> structure with increasing thickness. The electron mobility in a 5 nm thick film was as large as 560 cm<sup>2</sup>/Vs while it decreased to the typical vale of bulk crystals of about 10 cm<sup>2</sup>/Vs in the thicker films more than 30 nm.","PeriodicalId":434417,"journal":{"name":"2018 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK)","volume":"60 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMFEDK.2018.8581977","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
MBE growth of WO3 on (100) LSAT substrates is reported. It is revealed that the initial WO3 layer crystallizes in the cubic WO3 structure although the lattice constant in the growth direction is shrunken due to the coherent growth. This cubic structure is relaxed and becomes close to the orthorhombic WO3 structure with increasing thickness. The electron mobility in a 5 nm thick film was as large as 560 cm2/Vs while it decreased to the typical vale of bulk crystals of about 10 cm2/Vs in the thicker films more than 30 nm.