Investigation of BTI-induced Threshold Voltage Shift for Power MOSFETs during Switching Operation

Michihiro Shintani, Takashi Sato
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Abstract

The threshold voltage (Vth) shift caused by bias temperature instability (BTI) in power MOSFETs is crucial for ensuring the reliability of power conversion circuits. In this paper, a novel BTI-induced threshold voltage characterization method is presented. As opposed to existing methods in which static voltage input is applied, this method takes into account actual switching operations. Through the experiments using commercially available SiC MOSFETs, the Vth shift is evaluated and the physical mechanism of BTI is discussed on the basis of the measured Vth data.
开关工作中bti诱导功率mosfet阈值电压漂移的研究
功率mosfet中由偏置温度不稳定性(BTI)引起的阈值电压(Vth)漂移对于保证功率转换电路的可靠性至关重要。本文提出了一种新的bti感应阈值电压表征方法。与使用静态电压输入的现有方法相反,这种方法考虑到实际的开关操作。利用市售的SiC mosfet进行实验,评估了Vth位移,并根据测量到的Vth数据讨论了BTI的物理机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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