The application of pulse IV function in nano-prober system

Yu Te Lee, Jeng Hung Pan, Zenniss Huang, S. Liu, Y. P. Chang, J. Lin
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引用次数: 1

Abstract

A Nano-Prober System, combining scanning electron microscope (SEM), prober system, and measurement instrument is widely used in failure analysis field for soft localization. Most applications of the nano-prober system utilizes Direct Current (DC) electrical test to measure device characteristics. However, some failure mechanisms can hardly be diagnosed by applying traditional DC measurement. In this paper, Alternating Current (AC) pulse IV functional measurement was applied in soft failure study. A case screened out from speed test is adopted in this study. After non-abnormal is diagnosed via DC measurement, pulse IV measurement is used to conduct further measurement. While using pulse IV measurement method, the rising time of defective die is significantly longer than normal die, which is a convincing evidence that die failure is strongly related timing issue. Further Physical Failure Analysis (PFA) demonstrates that the poor connection between Poly and Contact layer is the major cause of the failure. The result of this paper indicates the effectiveness of pulse IV measurement in failure analysis.
脉冲IV函数在纳米探针系统中的应用
结合扫描电镜、探针系统和测量仪器的纳米探针系统被广泛应用于软定位失效分析领域。纳米探针系统的大多数应用采用直流(DC)电测试来测量器件特性。然而,传统的直流测量方法很难诊断出某些失效机制。本文将交流脉冲IV功能测量技术应用于软失效研究。本研究采用从速度试验中筛选出来的一个案例。经直流测量诊断无异常后,采用脉冲IV测量进行进一步测量。在采用脉冲IV测量方法时,缺陷模具的上升时间明显长于正常模具,这有力地证明了模具失效与时间问题密切相关。进一步的物理失效分析(PFA)表明,聚层与接触层之间的不良连接是导致失效的主要原因。本文的研究结果表明了脉冲IV测量在故障分析中的有效性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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