Investigation of UIS Capability for −600V Class Vertical SiC p-channel MOSFET

Kailun Yao, H. Yano, N. Iwamuro
{"title":"Investigation of UIS Capability for −600V Class Vertical SiC p-channel MOSFET","authors":"Kailun Yao, H. Yano, N. Iwamuro","doi":"10.1109/ISPSD.2019.8757607","DOIUrl":null,"url":null,"abstract":"Vertical planar gate 4H-SiC p-ch SiC MOSFET is fabricated as a potential candidate for complementary power applications. Its unclamped inductive switching (UIS) capability is investigated by measurement and TCAD simulation. The p-ch SiC MOSFET shows a low UIS capability rather than n-ch SiC MOSFET because of the unoptimized termination structure. The UIS capability of p-ch MOSFET can be improved by good design of edge region.","PeriodicalId":225029,"journal":{"name":"2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD)","volume":"25 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.2019.8757607","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

Abstract

Vertical planar gate 4H-SiC p-ch SiC MOSFET is fabricated as a potential candidate for complementary power applications. Its unclamped inductive switching (UIS) capability is investigated by measurement and TCAD simulation. The p-ch SiC MOSFET shows a low UIS capability rather than n-ch SiC MOSFET because of the unoptimized termination structure. The UIS capability of p-ch MOSFET can be improved by good design of edge region.
−600V级垂直SiC p沟道MOSFET的UIS性能研究
垂直平面栅极4H-SiC p-ch SiC MOSFET是互补功率应用的潜在候选器件。通过测量和TCAD仿真研究了其无箝位电感开关(UIS)性能。由于端接结构未优化,p-ch SiC MOSFET的UIS性能较n-ch SiC MOSFET低。良好的边缘区域设计可以提高p-ch型MOSFET的usis性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信
小红书