Wafer level fabrication of high performance MEMS using bonded and thinned bulk piezoelectric substrates

E. Aktakka, Hanseup Kim, Khalil Najafi
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引用次数: 26

Abstract

We report a batch-mode fabrication technology for integration of bulk piezoelectric materials into MEMS devices, and test results of high-performance out-of-plane piezoelectric actuators fabricated with this technology. Low-temperature (200°C), reliable AuIn and Parylene bonding of PZT wafers/dies on Si wafers is achieved, and lapping is used to obtain ≪10µm PZT films. Conservation of the piezoelectric properties is confirmed with a hysteresis measurement. Additionally, square and circular shaped PZT diaphragms with 4mm×4mm, 2mm×2mm, and 1mm×1mm sizes operating in the d31-mode are fabricated with a 2-mask fabrication process. Greater than 12µm peak-to-peak deflection is obtained by actuation of a 1mm2 diaphragm at resonance (110.9kHz) with a power consumption of ≪7mW.
晶圆级制造高性能MEMS的结合和薄体压电衬底
我们报道了一种将大块压电材料集成到MEMS器件中的批量制造技术,以及用该技术制造的高性能面外压电驱动器的测试结果。在硅晶片上实现了PZT晶片/模具的低温(200°C)、可靠的铟和聚对二甲苯粘合,并使用研磨获得了≪10 μ m PZT薄膜。通过迟滞测量证实了压电特性的守恒性。此外,在d31模式下工作的尺寸为4mm×4mm, 2mm×2mm和1mm×1mm的方形和圆形PZT隔膜采用2掩模制造工艺制造。通过在共振(110.9kHz)时驱动1mm2的膜片,可获得大于12 μ m的峰间偏转,功耗为≪7mW。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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