Thickness measurement for Cu and Ta thin films using optoacoustics

M. Gostein, T. Bailey, I. Emesh, A. Diebold, A. Maznev, M. Banet, M. Joffe, R. Sacco
{"title":"Thickness measurement for Cu and Ta thin films using optoacoustics","authors":"M. Gostein, T. Bailey, I. Emesh, A. Diebold, A. Maznev, M. Banet, M. Joffe, R. Sacco","doi":"10.1109/IITC.2000.854317","DOIUrl":null,"url":null,"abstract":"New all-optical, nondestructive metrology instruments for metal film thickness measurement have been developed using the opto-acoustic technique impulsive stimulated thermal scattering (ISTS). The technique uses lasers to initiate and detect acoustic waves in the sample film. In this study, a commercial ISTS-based instrument is evaluated for measuring Cu and Ta thin films, and the results are compared with 4-point probe, SEM, TEM, and GIXR. We also show that ISTS can be used in conjunction with 4-point-probe to determine resistivity for thin PVD Cu films.","PeriodicalId":287825,"journal":{"name":"Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-06-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IITC.2000.854317","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

Abstract

New all-optical, nondestructive metrology instruments for metal film thickness measurement have been developed using the opto-acoustic technique impulsive stimulated thermal scattering (ISTS). The technique uses lasers to initiate and detect acoustic waves in the sample film. In this study, a commercial ISTS-based instrument is evaluated for measuring Cu and Ta thin films, and the results are compared with 4-point probe, SEM, TEM, and GIXR. We also show that ISTS can be used in conjunction with 4-point-probe to determine resistivity for thin PVD Cu films.
利用光声学测量Cu和Ta薄膜的厚度
利用光声脉冲受激热散射技术研制了一种新型的全光学、无损金属膜厚度测量仪器。该技术使用激光来激发和探测样品膜中的声波。在本研究中,评估了一种基于ist的商用仪器用于测量Cu和Ta薄膜,并将结果与四点探针、SEM、TEM和GIXR进行了比较。我们还表明,ist可以与四点探针结合使用,以确定PVD Cu薄膜的电阻率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信