M. Gostein, T. Bailey, I. Emesh, A. Diebold, A. Maznev, M. Banet, M. Joffe, R. Sacco
{"title":"Thickness measurement for Cu and Ta thin films using optoacoustics","authors":"M. Gostein, T. Bailey, I. Emesh, A. Diebold, A. Maznev, M. Banet, M. Joffe, R. Sacco","doi":"10.1109/IITC.2000.854317","DOIUrl":null,"url":null,"abstract":"New all-optical, nondestructive metrology instruments for metal film thickness measurement have been developed using the opto-acoustic technique impulsive stimulated thermal scattering (ISTS). The technique uses lasers to initiate and detect acoustic waves in the sample film. In this study, a commercial ISTS-based instrument is evaluated for measuring Cu and Ta thin films, and the results are compared with 4-point probe, SEM, TEM, and GIXR. We also show that ISTS can be used in conjunction with 4-point-probe to determine resistivity for thin PVD Cu films.","PeriodicalId":287825,"journal":{"name":"Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-06-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IITC.2000.854317","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
New all-optical, nondestructive metrology instruments for metal film thickness measurement have been developed using the opto-acoustic technique impulsive stimulated thermal scattering (ISTS). The technique uses lasers to initiate and detect acoustic waves in the sample film. In this study, a commercial ISTS-based instrument is evaluated for measuring Cu and Ta thin films, and the results are compared with 4-point probe, SEM, TEM, and GIXR. We also show that ISTS can be used in conjunction with 4-point-probe to determine resistivity for thin PVD Cu films.