Observation of the Electron Reflection from N//N+ Junction in GaAs by Resonant Tunnelling through Pseudo-Quantum Well in Single Barrier Heterostructure
Y. Dubrovskiĭ, T. Andersson, Y. Khanin, I. Larkin, E. Vdovin
{"title":"Observation of the Electron Reflection from N//N+ Junction in GaAs by Resonant Tunnelling through Pseudo-Quantum Well in Single Barrier Heterostructure","authors":"Y. Dubrovskiĭ, T. Andersson, Y. Khanin, I. Larkin, E. Vdovin","doi":"10.7567/SSDM.1995.PD-L2-L2","DOIUrl":null,"url":null,"abstract":"Resonant tunnelling tlhrough virtual states in a wide pseudo-quanttum well is observed at liquid He temperature. This well is formed in the spacer layer region (n<sup>-</sup>-GaAs) of a single barrier heterostructure n<sup>+</sup>-GaAs/n<sup>-</sup>-GaAs/AIAs/n<sup>-</sup>-GaAs/n<sup>+</sup>-GaAs due to the electron reflection from the main barrier at one side and from the smooth potential drop through the n<sup>-</sup>/n<sup>+</sup> junction in the GaAs at the other side. The measured electron reflection coefficient from n<sup>-</sup>/n<sup>+</sup> junction is equal to 0.3%-3% in the energy interval relevant in the work.","PeriodicalId":252912,"journal":{"name":"ESSDERC '95: Proceedings of the 25th European Solid State Device Research Conference","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ESSDERC '95: Proceedings of the 25th European Solid State Device Research Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.7567/SSDM.1995.PD-L2-L2","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Resonant tunnelling tlhrough virtual states in a wide pseudo-quanttum well is observed at liquid He temperature. This well is formed in the spacer layer region (n--GaAs) of a single barrier heterostructure n+-GaAs/n--GaAs/AIAs/n--GaAs/n+-GaAs due to the electron reflection from the main barrier at one side and from the smooth potential drop through the n-/n+ junction in the GaAs at the other side. The measured electron reflection coefficient from n-/n+ junction is equal to 0.3%-3% in the energy interval relevant in the work.