High power 4H-SiC static induction transistors

R. Siergiej, R. C. Clarke, A.K. Aganval, C. Brandt, A. Burk, A. Morse, P. A. Orphanos
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引用次数: 26

Abstract

Static induction transistors have been demonstrated in 4H-SiC. SiC specific semiconductor processing technologies such as epitaxy, reactive ion etching, and sidewall Schottky gates were employed. Under pulsed power test conditions, 4H-SiC SITs developed a maximum output power of 225 W at 600 MHz, a power added efficiency of 47%, and a gain of 8.7 dB. Maximum channel current was 1 A/cm, and the maximum blocking voltage was 200 V.
大功率4H-SiC静电感应晶体管
静电感应晶体管已经在4H-SiC上得到了验证。SiC特定的半导体加工技术,如外延、反应离子蚀刻和侧壁肖特基门被采用。在脉冲功率测试条件下,4H-SiC sit在600 MHz下的最大输出功率为225 W,功率增加效率为47%,增益为8.7 dB。通道最大电流为1 A/cm,最大阻断电压为200 V。
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