Vikash Kumar, Chetan Kumar Dabhi, Shivendra Singh Parihar, Y. Chauhan
{"title":"Analysis and Compact Modeling of Drain-Extended FinFET","authors":"Vikash Kumar, Chetan Kumar Dabhi, Shivendra Singh Parihar, Y. Chauhan","doi":"10.1109/MOS-AK.2019.8902458","DOIUrl":null,"url":null,"abstract":"In this article, a comprehensive simulation and the compact model of drain extended FinFET for high power application is presented. Power FinFETs with different drain-extension designs (i.e. (i) multi-fin drain extended FinFET (ii) planar drain-extended FinFET) are simulated and analysed using 3-D Technology Computer-Aided Design (TCAD) simulation. TCAD calibrated intrinsic FinFET is modeled by the industry standard BSIM-CMG model. To model the effect of quasi-saturation due to drain-extension, current dependent resistance model is used along with BSIM-CMG model. The model is validated with TCAD simulations and, can be used for high power circuit simulations.","PeriodicalId":178751,"journal":{"name":"2019 IEEE Conference on Modeling of Systems Circuits and Devices (MOS-AK India)","volume":"65 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 IEEE Conference on Modeling of Systems Circuits and Devices (MOS-AK India)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MOS-AK.2019.8902458","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
In this article, a comprehensive simulation and the compact model of drain extended FinFET for high power application is presented. Power FinFETs with different drain-extension designs (i.e. (i) multi-fin drain extended FinFET (ii) planar drain-extended FinFET) are simulated and analysed using 3-D Technology Computer-Aided Design (TCAD) simulation. TCAD calibrated intrinsic FinFET is modeled by the industry standard BSIM-CMG model. To model the effect of quasi-saturation due to drain-extension, current dependent resistance model is used along with BSIM-CMG model. The model is validated with TCAD simulations and, can be used for high power circuit simulations.