Lead frame Hillock-Induced Silicon Crack

R. Flores, M. Fabia, M.T. Nabong, A. Soria, C.B. Gabunas
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Abstract

End customer in circuit test rejects at a rate of 2-5% was sent back to manufacturer for analysis and inspection. Electrical failure analysis had revealed some leakage on particular pin not included in the production test program. Physical failure analysis on those parts revealed micro-crack on affected pins. The micro cracks were found to be within the bonding vicinity and shown to have been propagating downwards into the silicon chip. The root cause was identified to be hillock on lead frame. Hillocks are formed on the surface of a lead frame during the rolling process of its base metal. Roller's surface irregularities and foreign materials on them could scrape the metal's surface. The scraped material's termination point will then produce an accumulated metal higher than the base surface. To sum up, the lead frame will produce tiny copper spikes on the surface which may cause a potential problem on IC packaging. Presence of these hillocks can cause a serious effect especially when its height already touches the surface of chip backside causing high stresses during wire bonding process. The work presents a new silicon crack mechanism and introduces stress modeling as a good validation tool in search for the root cause
引线框架山丘诱导硅裂纹
最终客户在电路测试中的次品率为2-5%,被送回制造商进行分析和检查。电气故障分析显示,在生产测试程序中未包括的特定引脚上有一些泄漏。对这些部件进行物理失效分析,发现受影响销上存在微裂纹。微裂纹位于键合附近,并向下延伸到硅芯片中。根本原因被确定为引线框架上的山丘。在引线框架的母材轧制过程中,引线框架表面会形成小丘。轧辊表面的不规则和异物会刮伤金属表面。然后,被刮材料的终止点将产生高于基面的累积金属。综上所述,引线框架会在表面产生微小的铜尖峰,这可能会对IC封装造成潜在的问题。这些小丘的存在会造成严重的影响,特别是当它的高度已经接触到芯片背面的表面时,会在导线粘合过程中产生高应力。该工作提出了一种新的硅裂纹机理,并引入应力建模作为一种很好的验证工具来寻找根本原因
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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