T. Frank, C. Chappaz, P. Leduc, L. Arnaud, F. Lorut, S. Moreau, A. Thuaire, R. El Farhane, L. Anghel
{"title":"Resistance increase due to electromigration induced depletion under TSV","authors":"T. Frank, C. Chappaz, P. Leduc, L. Arnaud, F. Lorut, S. Moreau, A. Thuaire, R. El Farhane, L. Anghel","doi":"10.1109/IRPS.2011.5784499","DOIUrl":null,"url":null,"abstract":"This paper focuses on the EM induced voiding in a line ended by a TSV, and proposes an analytical model based on the link between the monitored electrical resistance increase and the matter depletion flow.","PeriodicalId":242672,"journal":{"name":"2011 International Reliability Physics Symposium","volume":"19 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-04-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"75","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 International Reliability Physics Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS.2011.5784499","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 75
Abstract
This paper focuses on the EM induced voiding in a line ended by a TSV, and proposes an analytical model based on the link between the monitored electrical resistance increase and the matter depletion flow.