Electrical characteristics of CMOSFETs with gates crossing source/drain regions at 90/spl deg/ and 45/spl deg/

T. Ohzone, N. Matsuyama
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引用次数: 4

Abstract

The electrical characteristics of scaled CMOSFETs with gates crossing sources/drains at 90/spl deg/ and 45/spl deg/ are experimentally investigated using test devices fabricated by an n-well CMOS process with trench-isolation. The gain factors and the saturation drain-currents of n-MOSFETs are estimated by a simple correction theory which is derived by combining a center MOSFET and two edge MOSFETs. However, relatively large differences between the theoretical values and the experimental results are observed in p-MOSFETs with narrower widths less than the channel length. Other basic device parameters such as threshold voltages and subthreshold swings are qualitatively explained by the impurity profiles along the channel width direction, bird's beaks formed at the isolation-edges, and the change of channel length for narrow width 45/spl deg/ MOSFETs.
栅极在90/声压角和45/声压角下穿过源极/漏极的cmosfet的电特性
采用沟槽隔离的n阱CMOS工艺制造的测试器件,实验研究了栅极在90/spl度和45/spl度处穿过源极/漏极的缩放cmosfet的电特性。利用一个中心MOSFET和两个边缘MOSFET的简单校正理论,估计了n-MOSFET的增益因子和饱和漏极电流。然而,在宽度小于沟道长度的p- mosfet中,理论值与实验结果之间存在较大差异。其他基本器件参数如阈值电压和亚阈值振荡可以定性地解释为沿沟道宽度方向的杂质分布,在隔离边缘形成的鸟喙,以及窄宽度45/spl度/ mosfet的沟道长度变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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