Modeling and Simulation of Si IGBTs

N. Shigyo, M. Watanabe, K. Kakushima, T. Hoshii, K. Furukawa, A. Nakajima, K. Satoh, T. Matsudai, T. Saraya, T. Takakura, K. Itou, M. Fukui, S. Suzuki, K. Takeuchi, I. Muneta, H. Wakabayashi, S. Nishizawa, K. Tsutsui, T. Hiramoto, H. Ohashi, H. Iwai
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引用次数: 2

Abstract

Technology CAD (TCAD) has been recognized as a powerful design tool for Si insulated gate bipolar transistors (IGBTs). Here, physical models, such as a mobility model for carrier-carrier scattering, were investigated for a predictive TCAD. Simulated currentvoltage characteristics of the trench-gate IGBTs were compared with measurements. The difference between 3D- and 2D-TCAD simulations was observed in a high current region, which was explained by a bias-dependent current flow. A test element group (TEG) for separation of the emitter currents for holes and electrons was also determined as effective for calibration of lifetime model parameters.
Si igbt的建模与仿真
技术CAD (TCAD)已被公认为是硅绝缘栅双极晶体管(igbt)的强大设计工具。在这里,研究了物理模型,如载流子-载流子散射的迁移率模型,以预测TCAD。对沟槽栅igbt的模拟电流电压特性与实测结果进行了比较。3D和2D-TCAD模拟之间的差异是在高电流区域观察到的,这可以用偏置相关的电流来解释。还确定了用于分离空穴和电子的发射极电流的测试元件组(TEG)可有效地校准寿命模型参数。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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